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Low temperature SiNx:H films deposited by inductively coupled plasma for solar cell applications

โœ Scribed by Zhou, H.P.; Wei, D.Y.; Xu, L.X.; Guo, Y.N.; Xiao, S.Q.; Huang, S.Y.; Xu, S.


Book ID
118052867
Publisher
Elsevier Science
Year
2013
Tongue
English
Weight
784 KB
Volume
264
Category
Article
ISSN
0169-4332

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