Inductively coupled Ar/CH4/H2 plasmas for low-temperature deposition of ordered carbon nanostructures

✍ Scribed by Denysenko, I. B.; Xu, S.; Long, J. D.; Rutkevych, P. P.; Azarenkov, N. A.; Ostrikov, K.

• Book ID: 117991490
• Publisher: American Institute of Physics
• Year: 2004
• Tongue: English
• Weight: 782 KB
• Volume: 95
• Category: Article
• ISSN: 0021-8979
• DOI: 10.1063/1.1642762