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Low-temperature growth of highly conductive and transparent aluminum-doped ZnO film by ultrasonic-mist deposition

✍ Scribed by Seung-Woo Seo; Sung Ho Won; Heeyeop Chae; Sung Min Cho

Book ID
113090762
Publisher
Springer US
Year
2012
Tongue
English
Weight
533 KB
Volume
29
Category
Article
ISSN
0256-1115

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πŸ“œ SIMILAR VOLUMES

Low temperature growth of transparent co
Low temperature growth of transparent conducting ZnO films by plasma assisted deposition
✍ Nishii, A. ;Uehara, T. ;Sakano, T. ;Nabetani, Y. ;Akitsu, T. ;Kato, T. ;Matsumot πŸ“‚ Article πŸ“… 2006 πŸ› John Wiley and Sons 🌐 English βš– 599 KB

## Abstract Transparent conducting ZnO films are deposited by plasma assisted deposition technique on glass and plastic substrates at temperatures 60 ∼ 300 Β°C using metallic Zn, metallic Ga and plasma‐excited oxygen as source materials. Deposited films were characterized by X‐ray diffraction (XRD),