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Low temperature preparation of transparent conducting ZnO:Al thin films by chemical beam deposition

✍ Scribed by H. Sato; T. Minami; S. Takata; T. Miyata; M. Ishii


Book ID
107864298
Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
495 KB
Volume
236
Category
Article
ISSN
0040-6090

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## Abstract Transparent conducting ZnO films are deposited by plasma assisted deposition technique on glass and plastic substrates at temperatures 60 ∼ 300 Β°C using metallic Zn, metallic Ga and plasma‐excited oxygen as source materials. Deposited films were characterized by X‐ray diffraction (XRD),