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Low-Temperature Preparation of Undoped ZnO Films with High Transparency and Conductivity by Ion Beam Deposition

✍ Scribed by Jung-Hsiung Shen; Sung-Wei Yeh; Hsing-Lu Huang; Dershin Gan; New-Jin Ho

Book ID
107455820
Publisher
Springer US
Year
2010
Tongue
English
Weight
426 KB
Volume
39
Category
Article
ISSN
0361-5235

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Low temperature growth of transparent co
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## Abstract Transparent conducting ZnO films are deposited by plasma assisted deposition technique on glass and plastic substrates at temperatures 60 ∼ 300 Β°C using metallic Zn, metallic Ga and plasma‐excited oxygen as source materials. Deposited films were characterized by X‐ray diffraction (XRD),