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Low-temperature deposition of transparent conducting Mn-W co-doped ZnO thin films

✍ Scribed by Huafu, Zhang; Hanfa, Liu; Chengxin, Lei; Aiping, Zhou; Changkun, Yuan


Book ID
121456115
Publisher
IOP Publishing
Year
2010
Tongue
English
Weight
271 KB
Volume
31
Category
Article
ISSN
1674-4926

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## Abstract Transparent conducting ZnO films are deposited by plasma assisted deposition technique on glass and plastic substrates at temperatures 60 ∼ 300 Β°C using metallic Zn, metallic Ga and plasma‐excited oxygen as source materials. Deposited films were characterized by X‐ray diffraction (XRD),