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Low temperature deposition: Properties of SiO 2 films from TEOS and ozone by APCVD system

✍ Scribed by Juárez, H; Pacio, M; Díaz, T; Rosendo, E; Garcia, G; García, A; Mora, F; Escalante, G


Book ID
121251471
Publisher
Institute of Physics
Year
2009
Tongue
English
Weight
402 KB
Volume
167
Category
Article
ISSN
1742-6588

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