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Correlations between the properties and the deposition kinetics of low-temperature chemical vapour deposited SiO2films: the effect of O2/SiH4mole ratio

โœ Scribed by C. Pavelescu; C. Cobianu


Publisher
Springer
Year
1990
Tongue
English
Weight
123 KB
Volume
9
Category
Article
ISSN
0261-8028

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