✦ LIBER ✦

Etching kinetics of the low temperature chemically vapour deposited SiO2films

✍ Scribed by C. Pavelescu; C. Cobianu; E. Segal

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Etch rate of low-temperature chemically

✍ C. Pavelescu; C. Cobianu; E. Segal 📂 Article 📅 1985 🏛 Springer 🌐 English ⚖ 154 KB

On the role of carrier gas in the deposi

✍ C. Cobianu; C. Pavelescu; E. Segal 📂 Article 📅 1987 🏛 Elsevier Science 🌐 English ⚖ 394 KB

Dry etching of low-temperature chemicall

✍ R. Bantoiu; C. Pavelescu; V. Avramescu 📂 Article 📅 1991 🏛 Springer 🌐 English ⚖ 208 KB

Change in water vapour adsorption kineti

✍ G.M. Tseytlin; A.G. Noskov; N.N. Gerasimenko; S.I. Stenin 📂 Article 📅 1988 🏛 Elsevier Science 🌐 English ⚖ 431 KB

Etch rate behaviour of SiO2 films chemic

✍ C. Pavelescu; C. Cobianu; L. Condriuc; E. Segal 📂 Article 📅 1984 🏛 Elsevier Science 🌐 English ⚖ 249 KB

Etch rate behaviour of SiO2 films chemic

✍ Irina Kleps; Cristian Pavelescu 📂 Article 📅 1990 🏛 Elsevier Science 🌐 English ⚖ 220 KB