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A mechanism for the surface reaction between silane and oxygen at low temperature and correlations with the properties of the deposited SiO2films

✍ Scribed by C. Pavelescu; C. Cobianu

Publisher: Springer
Year: 1988
Tongue: English
Weight: 242 KB
Volume: 7
Category: Article
ISSN: 0261-8028
DOI: 10.1007/bf00720846

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