๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Low Temperature Chemical Vapor Deposition of Titanium Nitride Thin Films with Hydrazine and Tetrakis(dimethylamido)titanium

โœ Scribed by Amato-Wierda, Carmela


Book ID
115522249
Publisher
The Electrochemical Society
Year
1999
Tongue
English
Weight
87 KB
Volume
2
Category
Article
ISSN
1099-0062

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


CVD of Titanium Oxide Thin Films from th
โœ J.โ€‰B. Woods; D.โ€‰B. Beach; C.โ€‰L. Nygren; Z.-L. Xue ๐Ÿ“‚ Article ๐Ÿ“… 2005 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 235 KB

TiO~2~ thin films on silicon wafers have been prepared from the reaction of Ti(NMe~2~)~4~ with O~2~ at 250โ€“300โ€‰ยฐC by CVD processes. These films, which are carbon free and contain no TiN or TiO~__x__~N~__y__~ species, are amorphous before annealing but crystalline anatase after annealing at 600โ€‰ยฐC in