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Low-resistance MOS technology using self-aligned refractory silicidation

✍ Scribed by Okabayashi, H.; Morimoto, M.; Nagasawa, E.

Book ID: 114594862
Publisher: IEEE
Year: 1984
Tongue: English
Weight: 931 KB
Volume: 31
Category: Article
ISSN: 0018-9383
DOI: 10.1109/t-ed.1984.21708

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