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A low thermal budget self-aligned Ti silicide technology using germanium implantation for thin-film SOI MOSFET's

✍ Scribed by Ping Liu; Hsiao, T.C.; Woo, J.C.S.


Book ID
114537295
Publisher
IEEE
Year
1998
Tongue
English
Weight
190 KB
Volume
45
Category
Article
ISSN
0018-9383

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