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Low-frequency, high-density, inductively coupled plasma sources: Operation and applications

โœ Scribed by Xu, S.; Ostrikov, K. N.; Li, Y.; Tsakadze, E. L.; Jones, I. R.


Book ID
118045305
Publisher
American Institute of Physics
Year
2001
Tongue
English
Weight
496 KB
Volume
8
Category
Article
ISSN
1070-664X

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