Liquid-target laser-plasma source for X-ray lithography

✍ Scribed by L. Malmqvist; A.L. Bogdanov; L. Montelius; H.M. Hertz

• Publisher: Elsevier Science
• Year: 1997
• Tongue: English
• Weight: 97 KB
• Volume: 35
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/s0167-9317(97)87391-1

✦ Synopsis

Division of Atomic Physics tDivision of Solid State Physics

We describe a compact and practically debris-free laser-plasma x-ray source suitable for proximity lithography. The source is based on a microscopic fluorocarbon continuous liquid jet droplet target, generating highbrightness ~=1.2-1.7 nm x-ray emission with -5% conversion efficiency. This target type has the advantages of producing only negligible amounts of debris, and being regenerative, thereby allowing high-repetition-rate uninterrupted operation. The source is combined with an Au/SiNx x-ray mask to demonstrate lithography of sub-100 nm structures in SAL-601 chemically enhanced resist.