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Limitations of LDD types of structures in deep-submicrometer MOS technology

โœ Scribed by A. Tasch; H. Shin; T. Bordelon; C. Maziar


Book ID
126684125
Publisher
IEEE
Year
1990
Tongue
English
Weight
343 KB
Volume
11
Category
Article
ISSN
0741-3106

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Characterization of deep levels in Si-MO
โœ Susumu Iwamoto; Haruhiko Yoshida; Seigo Kishino ๐Ÿ“‚ Article ๐Ÿ“… 2000 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 179 KB

Interface traps and bulk traps induced by heavy metal impurities in Si-MOS structure were characterized by isothermal capacitance transient spectroscopy (ICTS). In addition, the use of an MOS inversion time is proposed for the detection of a very low density of heavy metal impurities in the ICTS mea