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Use of the polysilicon gate layer for local interconnect in a CMOS technology incorporating LDD structures
✍ Scribed by El-Diwany, M.H.; Brassington, M.P.; Tuntasood, P.; Razouk, R.R.; Poulter, M.W.
- Book ID
- 114535557
- Publisher
- IEEE
- Year
- 1988
- Tongue
- English
- Weight
- 376 KB
- Volume
- 35
- Category
- Article
- ISSN
- 0018-9383
- DOI
- 10.1109/16.2591
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