𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Laser approaches for deposition of carbon nitride films — chemical vapour deposition and ablation

✍ Scribed by Popov, C; Jelinek, M; Ivanov, B; Tomov, R.I; Kulisch, W


Book ID
122845092
Publisher
Elsevier Science
Year
1999
Tongue
English
Weight
139 KB
Volume
8
Category
Article
ISSN
0925-9635

No coin nor oath required. For personal study only.


📜 SIMILAR VOLUMES


Filament-activated chemical vapour depos
✍ Sadanand V. Deshpande; Jeffrey L. Dupuie; Erdogan Gulari 📂 Article 📅 1996 🏛 John Wiley and Sons 🌐 English ⚖ 987 KB

We have applied the novel method of hot filament-activated chemical vapour deposition (HFCVD) for low-temperature deposition of a variety of nitride thin films. In this paper the results from our recent work on aluminium, silicon and titanium nitride have been reviewed. In the HFCVD method a hot tun