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Kinetics of silicon amorphization by N+ implantation: Dose rate and substrate temperature effects

✍ Scribed by A. Claverie; A. Roumili; N. Gessinn; J. Beauvillain

Publisher: Elsevier Science
Year: 1989
Tongue: English
Weight: 594 KB
Volume: 4
Category: Article
ISSN: 0921-5107
DOI: 10.1016/0921-5107(89)90243-2

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