✦ LIBER ✦

Irradiation damages in electron beam lithography

✍ Scribed by Sun Yuping; Zhu Wenzhen; Liang Junhou; Ge Huang; Liang Jiuchun

Book ID: 112890754
Publisher: SP Science Press
Year: 1986
Tongue: English
Weight: 372 KB
Volume: 3
Category: Article
ISSN: 0217-9822
DOI: 10.1007/bf02778895

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Radiation damage processes affecting ele

Radiation damage processes affecting electron beam lithography of inorganic materials

✍ Douglas L. Medlin; David G. Howitt 📂 Article 📅 1992 🏛 Hindawi Limited 🌐 English ⚖ 509 KB

Instrumentation for electron beam lithog

Instrumentation for electron beam lithography

✍ Chang, T. 📂 Article 📅 1974 🏛 IEEE 🌐 English ⚖ 889 KB

Electron irradiation of polymerisable la

Electron irradiation of polymerisable langmuir-blodgett multilayers as model resists for electron-beam lithography

✍ Boothroyd, Brian ;Delaney, Paul A. ;Hann, Richard A. ;Johnstone, Robert A. W. ;L 📂 Article 📅 1985 🏛 Wiley (John Wiley & Sons) 🌐 English ⚖ 589 KB

Resist debris formation in electron beam

Resist debris formation in electron beam lithography

✍ P.R. Deshmukh; K.J. Rangra; O.P. Wadhawan 📂 Article 📅 1999 🏛 Elsevier Science 🌐 English ⚖ 978 KB

The resist debris (RD) formation dependence on beam stepping to beam size ratio in electron beam lithography (EBL) is theoretically and experimentally investigated. The theoretically simulated results show a distinct variation in RD formation as the beam stepping to beam size ratio is varied from 0.

Electron beam lithography in passivated

Electron beam lithography in passivated gold nanoclusters

✍ T.R. Bedson; R.E. Palmer; J.P. Wilcoxon 📂 Article 📅 2001 🏛 Elsevier Science 🌐 English ⚖ 972 KB

Progress and challenges in electron beam

Progress and challenges in electron beam lithography

✍ H.C. Pfeiffer 📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 36 KB