๐”– Bobbio Scriptorium
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Progress and challenges in electron beam lithography

โœ Scribed by H.C. Pfeiffer


Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
36 KB
Volume
9
Category
Article
ISSN
0167-9317

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Charging effect reduction in electron be
โœ Jian Zhang; Mina Fouad; Mustafa Yavuz; Bo Cui ๐Ÿ“‚ Article ๐Ÿ“… 2011 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 509 KB

Charging effect becomes a more serious issue when performing electron beam lithography using high beam current. Here we studied the charging effect using PMMA, PMGI and ZEP-520A resist to pattern 200 nm period hole array. It is found that charging effect can be reduced by simply re-arranging the exp