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Instrumentation for electron beam lithography

โœ Scribed by Chang, T.


Book ID
117922278
Publisher
IEEE
Year
1974
Tongue
English
Weight
889 KB
Volume
10
Category
Article
ISSN
0018-9464

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A new model called ProBEAM/3D is introduced for the simulation of electron beam lithography and applied to the problem of mask making. Monte Carlo simulations are combined with a beam shape to generate a single "pixel" energy distribution. This pixel is then used to write a pattern by controlling th