๐”– Bobbio Scriptorium
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Large data buffer for electron beam lithography

โœ Scribed by J.P. Melot; A.W. Sloman; M.J. Penberth


Book ID
103597922
Publisher
Elsevier Science
Year
1987
Tongue
English
Weight
288 KB
Volume
6
Category
Article
ISSN
0167-9317

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A new model called ProBEAM/3D is introduced for the simulation of electron beam lithography and applied to the problem of mask making. Monte Carlo simulations are combined with a beam shape to generate a single "pixel" energy distribution. This pixel is then used to write a pattern by controlling th