This paper describes work carried out to optimise two DUV photoresists for high resolution electron beam lithography using experimental design techniques. Shipley UV5 XM positive tone resist and UVN2 negative tone resist have been studied. Screening experiments were initially carried out to identify
β¦ LIBER β¦
Electron beam photoresists for nanoimprint lithography
β Scribed by C. Gourgon; C. Perret; G. Micouin
- Book ID
- 114155368
- Publisher
- Elsevier Science
- Year
- 2002
- Tongue
- English
- Weight
- 483 KB
- Volume
- 61-62
- Category
- Article
- ISSN
- 0167-9317
No coin nor oath required. For personal study only.
π SIMILAR VOLUMES
Process optimisation of DUV photoresists
β
S. Thoms; D. Macintyre
π
Article
π
1999
π
Elsevier Science
π
English
β 788 KB
Nanoimprint lithography for organic elec
β
C. Clavijo CedeΓ±o; J. Seekamp; A.P. Kam; T. Hoffmann; S. Zankovych; C.M. Sotomay
π
Article
π
2002
π
Elsevier Science
π
English
β 593 KB
Investigation of SOI photonic crystals f
β
M. Belotti; M. Galli; D. Bajoni; L.C. Andreani; G. Guizzetti; D. Decanini; Y. Ch
π
Article
π
2004
π
Elsevier Science
π
English
β 474 KB
Combinatorial Optimization of a Molecula
β
Wolfgang-Andreas C. Bauer; Christian Neuber; Christopher K. Ober; Hans-Werner Sc
π
Article
π
2011
π
John Wiley and Sons
π
English
β 428 KB
Proton beam fabrication of nickel stamps
β
K. Ansari; P.G. Shao; J.A. van Kan; A.A. Bettiol; F. Watt
π
Article
π
2005
π
Elsevier Science
π
English
β 339 KB
Nickel stamps with micro and nano-scale relief features on their surfaces have been fabricated using proton beam writing coupled with nickel sulfamate electroplating. A focused beam of sub-micron 2.0 MeV protons was used to direct-write 3D patterns into spin coated PMMA resist, and a single step nic
Electron beam maskmaking using photoresi
β
A. Weidner; P. Hahmann
π
Article
π
1992
π
Elsevier Science
π
English
β 306 KB