Combinatorial Optimization of a Molecular Glass Photoresist System for Electron Beam Lithography

✍ Scribed by Wolfgang-Andreas C. Bauer; Christian Neuber; Christopher K. Ober; Hans-Werner Schmidt

• Publisher: John Wiley and Sons
• Year: 2011
• Tongue: English
• Weight: 428 KB
• Volume: 23
• Category: Article
• ISSN: 0935-9648
• DOI: 10.1002/adma.201103107