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Ionized physical vapor deposition of titanium nitride: A global plasma model

✍ Scribed by Tao, K.; Mao, D.; Hopwood, J.

Book ID: 120238975
Publisher: American Institute of Physics
Year: 2002
Tongue: English
Weight: 369 KB
Volume: 91
Category: Article
ISSN: 0021-8979
DOI: 10.1063/1.1455139

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