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Highly ionized physical vapor deposition plasma source working at very low pressure
✍ Scribed by Stranak, V.; Herrendorf, A.-P.; Drache, S.; Cada, M.; Hubicka, Z.; Tichy, M.; Hippler, R.
- Book ID
- 121751374
- Publisher
- American Institute of Physics
- Year
- 2012
- Tongue
- English
- Weight
- 787 KB
- Volume
- 100
- Category
- Article
- ISSN
- 0003-6951
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