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Ion implantation induced damage in relaxed Si0.75Ge0.25

✍ Scribed by F. Priolo; C. Spinella; E. Albertazzi; M. Bianconi; G. Lulli; R. Nipoti; J.K.N. Lindner; A. Mesli; R.C. Barklie; L. Sealy; B. Holm; A. Nylandsted^Larsen

Book ID: 113287067
Publisher: Elsevier Science
Year: 1996
Tongue: English
Weight: 460 KB
Volume: 112
Category: Article
ISSN: 0168-583X
DOI: 10.1016/0168-583x(95)01010-6

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