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Ion composition produced by high power impulse magnetron sputtering discharges near the substrate

✍ Scribed by Ehiasarian, A. P.; Vetushka, A.; Hecimovic, A.; Konstantinidis, S.


Book ID
120198490
Publisher
American Institute of Physics
Year
2008
Tongue
English
Weight
662 KB
Volume
104
Category
Article
ISSN
0021-8979

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High power impulse magnetron sputtering
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High power impulse magnetron sputtering (HIPIMS) and related self-sputtering techniques are reviewed from a viewpoint of plasma-based ion implantation and deposition (PBII&D). HIPIMS combines the classical, scalable sputtering technology with pulsed power, which is an elegant way of ionizing the spu