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Origins of ion energy distribution function (IEDF) in high power impulse magnetron sputtering (HIPIMS) plasma discharge

✍ Scribed by Hecimovic, A; Burcalova, K; Ehiasarian, A P

Book ID
121439848
Publisher
Institute of Physics
Year
2008
Tongue
English
Weight
781 KB
Volume
41
Category
Article
ISSN
0022-3727

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✍ Anders, André 📂 Article 📅 2008 🏛 John Wiley and Sons 🌐 English ⚖ 431 KB

## Abstract The emerging technology of High Power Impulse Magnetron Sputtering (HIPIMS) has much in common with the more established technology of Plasma‐Based Ion Implantation & Deposition (PBIID): both use pulsed plasmas, the pulsed sheath periodically evolves and collapses, the plasma‐sheath sys