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Ion beam studies of Hafnium based alternate high-k dielectric films deposited on silicon

✍ Scribed by Manikanthababu, N.; Chan, T.K.; Pathak, A.P.; Devaraju, G.; Srinivasa Rao, N.; Yang, P.; Breese, M.B.H.; Osipowicz, T.; Nageswara Rao, S.V.S.

Book ID: 122334809
Publisher: Elsevier Science
Year: 2014
Tongue: English
Weight: 823 KB
Volume: 332
Category: Article
ISSN: 0168-583X
DOI: 10.1016/j.nimb.2014.02.103

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