✦ LIBER ✦
Thermal stability of Hf-based high-k dielectric films on silicon for advanced CMOS devices
✍ Scribed by K.P. Bastos; C. Driemeier; R.P. Pezzi; G.V. Soares; L. Miotti; J. Morais; I.J.R. Baumvol; R.M. Wallace
- Publisher
- Elsevier Science
- Year
- 2004
- Tongue
- English
- Weight
- 165 KB
- Volume
- 112
- Category
- Article
- ISSN
- 0921-5107
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