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Investigation of the optimized parameters of microwave plasma-assisted chemical vapour deposition reactor operation in a pulsed mode

โœ Scribed by Vikharev, A L; Gorbachev, A M; Muchnikov, A B; Radishev, D B; Kopelovich, E A; Troitskiy, M M

Book ID
121389474
Publisher
Institute of Physics
Year
2012
Tongue
English
Weight
698 KB
Volume
45
Category
Article
ISSN
0022-3727

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โœ Belmahi, M. ;Le Brizoual, L. ;Assouar, M. B. ;Tousch, T. ;Vergnat, M. ;Bougdira, ๐Ÿ“‚ Article ๐Ÿ“… 2005 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 282 KB

## Abstract In this study we present the first results achieved on the growth of carbon nanotubes (CNT) in both continuous mode (CM) and pulsed mode (PM) microwave plasma assisted chemical vapour deposition (MPACVD). The interest of this work is to determine the influence of the discharge parameter