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Investigation of silicon etching and silicon dioxide bubble formation during silicon oxidation in HCl-oxygen atmospheres

✍ Scribed by D.W. Hess; R.C. McDonald

Publisher: Elsevier Science
Year: 1977
Tongue: English
Weight: 289 KB
Volume: 42
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(77)90086-4

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