✦ LIBER ✦
7353. Native oxide removal during chlorine reactive ion etching of silicon in an rf diode reactor: J H Thomas III and L H Hammer, J Appl Phys, 68, 1990, 2400–2405
- Publisher
- Elsevier Science
- Year
- 1991
- Tongue
- English
- Weight
- 148 KB
- Volume
- 42
- Category
- Article
- ISSN
- 0042-207X
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