5160. Oxygen impurity effects at metal/silicide interfaces: Formation of silicon oxide and suboxides in the NiSi system: P J Grunthaner et al, J Vac Sci Technol, 19 (3), 1981, 641–648

• Publisher: Elsevier Science
• Year: 1982
• Tongue: English
• Weight: 144 KB
• Volume: 32
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(82)94193-8