๐”– Bobbio Scriptorium
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Investigation of lattice defects by means of X-rays. I. Tin

โœ Scribed by J.J. Arlman; R. Kronig


Publisher
Elsevier Science
Year
1943
Weight
612 KB
Volume
10
Category
Article
ISSN
0031-8914

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๐Ÿ“œ SIMILAR VOLUMES


Investigations of lattice defects by mea
โœ L.L. Van Reijen ๐Ÿ“‚ Article ๐Ÿ“… 1944 ๐Ÿ› Elsevier Science โš– 875 KB

This paper forms part II of a series of publications on the above subject. Part I is an article by J. J. A r 1 m a n and R. I< r o n i g 1 ) on lattice defects in tin.

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Multi-crystal X-ray diffraction has been used to study the strain located close to the Si-SiO 2 interface of device grade SIMOX substrates. It is found that the strain is located within a layer whose thickness is about 15% of the silicon overlayer. The quality of this layer can be restored by anneal