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Investigation of environmental stability in chemically amplified resists

✍ Scribed by H. Yoshino; T. Itani; S. Hashimoto; M. Yamana; N. Samoto; K. Kasama; A.G. Timko; O. Nalamasu

Publisher
Elsevier Science
Year
1997
Tongue
English
Weight
276 KB
Volume
35
Category
Article
ISSN
0167-9317

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In order to clarify the photogenerated acid diffusion in resist film, the diffusion behavior of acid, as well as the role of additional base component was investigated in tert-butoxycarbonyl (t-BOC) protected type chemically amplified positive deep ultraviolet (DUV) resists. The resists consisted of

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A mechanism of acid-catalyzed deprotection of poly(4-tert-butyloxycarbonyloxy-styrene), PBOCST, in chemically amplified resists has been elucidated in terms of elementary processes by means of semiempirical molecular orbital calculations. It is concluded that the overall deprotection of tert-butylox