In order to clarify the photogenerated acid diffusion in resist film, the diffusion behavior of acid, as well as the role of additional base component was investigated in tert-butoxycarbonyl (t-BOC) protected type chemically amplified positive deep ultraviolet (DUV) resists. The resists consisted of
Diffusion phenomenon and loss of adhesion in chemically amplified negative resists
✍ Scribed by Gilles Amblard; Alain Inard; André Weill; Frédéric Lalanne; Jean Pierre Panabiere
- Publisher
- Elsevier Science
- Year
- 1992
- Tongue
- English
- Weight
- 392 KB
- Volume
- 17
- Category
- Article
- ISSN
- 0167-9317
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