𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Diffusion phenomenon and loss of adhesion in chemically amplified negative resists

✍ Scribed by Gilles Amblard; Alain Inard; André Weill; Frédéric Lalanne; Jean Pierre Panabiere


Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
392 KB
Volume
17
Category
Article
ISSN
0167-9317

No coin nor oath required. For personal study only.


📜 SIMILAR VOLUMES


Acid and base diffusion in chemically am
✍ T. Itani; H. Yoshino; S. Hashimoto; M. Yamana; N. Samoto; K. Kasama 📂 Article 📅 1997 🏛 Elsevier Science 🌐 English ⚖ 274 KB

In order to clarify the photogenerated acid diffusion in resist film, the diffusion behavior of acid, as well as the role of additional base component was investigated in tert-butoxycarbonyl (t-BOC) protected type chemically amplified positive deep ultraviolet (DUV) resists. The resists consisted of

Molecular dynamics simulation of gel for
✍ G.P. Patsis; N. Glezos 📂 Article 📅 1999 🏛 Elsevier Science 🌐 English ⚖ 631 KB

The knowledge of the structural changes that occur during the lithographic process using chemically amplified resists (CARs) is of great importance in process and resist optimization. Molecular dynamics (MD) is a suitable method for the simulation of these microscopic changes. A detailed description

Acid-catalyzed deprotection mechanism of
✍ Rieko Ichikawa; Masayuki Hata; Noriaki Okimoto; Setsuko Oikawa–Handa; Minoru Tsu 📂 Article 📅 1998 🏛 John Wiley and Sons 🌐 English ⚖ 331 KB

A mechanism of acid-catalyzed deprotection of poly(4-tert-butyloxycarbonyloxy-styrene), PBOCST, in chemically amplified resists has been elucidated in terms of elementary processes by means of semiempirical molecular orbital calculations. It is concluded that the overall deprotection of tert-butylox