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Introduction of crystalline high-k gate dielectrics in a CMOS process

✍ Scribed by H.D.B. Gottlob; M.C. Lemme; T. Mollenhauer; T. Wahlbrink; J.K. Efavi; H. Kurz; Y. Stefanov; K. Haberle; R. Komaragiri; T. Ruland; F. Zaunert; U. Schwalke

Book ID: 116668597
Publisher: Elsevier Science
Year: 2005
Tongue: English
Weight: 188 KB
Volume: 351
Category: Article
ISSN: 0022-3093
DOI: 10.1016/j.jnoncrysol.2005.04.032

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