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High-k Gate Dielectrics for CMOS Technology (HE:HIGH-K DIELECTRICS O-BK) || UV Engineering of High-k Thin Films

โœ Scribed by He, Gang; Sun, Zhaoqi

Book ID
120474440
Publisher
Wiley-VCH Verlag GmbH & Co. KGaA
Year
2012
Weight
374 KB
Category
Article
ISBN
3527330321

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๐Ÿ“œ SIMILAR VOLUMES

Investigation of strontium tantalate thi
Investigation of strontium tantalate thin films for high-k gate dielectric applications
โœ M. Silinskas; M. Lisker; B. Kalkofen; E.P. Burte ๐Ÿ“‚ Article ๐Ÿ“… 2006 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 456 KB

Strontium tantalate (STO) films were grown by liquid-delivery (LD) metalorganic chemical vapor deposition (MOCVD) using Sr[Ta(OEt) 5 (OC 2 H 4 OMe)] 2 as precursor. The deposition of the films was investigated in dependence on process conditions, such as substrate temperature, pressure, and concentr