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Injection of point defects during annealing of low energy As implanted silicon

✍ Scribed by C. Tsamis; D. Skarlatos; V. Valamontes; D. Tsoukalas; G. BenAssayag; A. Claverie; W. Lerch

Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
223 KB
Volume
124-125
Category
Article
ISSN
0921-5107

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