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Influences of Ti, TiN, Ta and TaN layers on integration of low-k SiOC:H and Cu

✍ Scribed by Kou-Chiang Tsai; Wen-Fa Wu; Chuen-Guang Chao; Jwo-Lun Hsu; Chiu-Fen Chiang

Book ID: 113782134
Publisher: Elsevier Science
Year: 2007
Tongue: English
Weight: 981 KB
Volume: 104
Category: Article
ISSN: 0254-0584
DOI: 10.1016/j.matchemphys.2007.02.083

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