Influence of the ion synthesis and ion doping regimes on the effect of sensitization of erbium emission by silicon nanoclusters in silicon dioxide films

✍ Scribed by Korolev, D. S.; Kostyuk, A. B.; Belov, A. I.; Mikhaylov, A. N.; Dudin, Yu. A.; Bobrov, A. I.; Malekhonova, N. V.; Pavlov, D. A.; Tetelbaum, D. I.

• Book ID: 121607516
• Publisher: SP MAIK Nauka/Interperiodica
• Year: 2013
• Tongue: English
• Weight: 421 KB
• Volume: 55
• Category: Article
• ISSN: 1063-7834
• DOI: 10.1134/S1063783413110127