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The influence of Cs, Rb, K, and Na implanted in silicon on the emission of silicon secondary ions

✍ Scribed by W. Frentrup; H. Kerkow; U. Müller- Jahreis

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

The Influence of Cesium Implanted in Sil

✍ Frentrup, W. ;Wiepentrog, M. ;Müller-Jahreis, U. 📂 Article 📅 1983 🏛 John Wiley and Sons 🌐 English ⚖ 187 KB

The influence of alkali atoms implanted

✍ Frentrup, W. ;Griepertrog, M. ;Klose, H. ;Kreysch, G. ;Müller-Jahreis, U. 📂 Article 📅 1984 🏛 John Wiley and Sons 🌐 English ⚖ 279 KB

Analysis of ion implanted silicon by RBS

✍ M. Bianconi; E. Albertazzi; S. Balboni; G. Lulli 📂 Article 📅 2004 🏛 Elsevier Science 🌐 English ⚖ 273 KB

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✍ J.M. Morabito; J.C. Tsai 📂 Article 📅 1972 🏛 Elsevier Science 🌐 English ⚖ 277 KB

Quasi-resonance processes in the emissio

✍ V.A. Abramenko; D.V. Ledyanklin; I.F. Urazgil'din; V.E. Yurasova 📂 Article 📅 1988 🏛 Elsevier Science 🌐 English ⚖ 315 KB

The influence of foreigen atoms on the e

✍ Kerkow, H. ;Kreysch, G. ;Lukasch, B. 📂 Article 📅 1984 🏛 John Wiley and Sons 🌐 English ⚖ 508 KB