Ion beam synthesis of Te and Bi nanoclusters in silicon: The effect of post-implantation high frequency electromagnetic field

✍ Scribed by M. Kalitzova; A. Peeva; V. Ignatova; O.I. Lebedev; G. Zollo; G. Vitali

• Publisher: Elsevier Science
• Year: 2006
• Tongue: English
• Weight: 319 KB
• Volume: 242
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/j.nimb.2005.08.017