Influence of the AlN interlayer crystal quality on the strain evolution of GaN layer grown on Si (111)
β Scribed by Liu, W.; Zhu, J. J.; Jiang, D. S.; Yang, H.; Wang, J. F.
- Book ID
- 121416759
- Publisher
- American Institute of Physics
- Year
- 2007
- Tongue
- English
- Weight
- 313 KB
- Volume
- 90
- Category
- Article
- ISSN
- 0003-6951
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This work presents a detailed study of the subgrain structure of Si doped GaN grown on AlN buffered (111)Si substrates by plasma-assisted Molecular Beam Epitaxy. Si doping increases from an unintentionally undoped sample up to 1.7 Γ 10 19 cm -3 . The subgrain size distribution fits quite precisely a
## Abstract Crackβfree GaN films have been achieved by inserting an Inβdoped lowβtemperature (LT) AlGaN interlayer grown on silicon by metalorganic chemical vapor deposition. The relationship between lattice constants __c__ and __a__ obtained by Xβray diffraction analysis shows that indium doping i