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Influence of substrate temperature on growth of a-Si:H films by reactive facing target sputtering deposition

✍ Scribed by Wei Yu; LingHai Meng; Jing Yuan; HaiJiang Lu; ShuJie Wu; GuangSheng Fu

Book ID: 107363665
Publisher: Science in China Press (SCP)
Year: 2010
Tongue: English
Weight: 435 KB
Volume: 53
Category: Article
ISSN: 1672-1799
DOI: 10.1007/s11433-010-0193-z

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