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Influence of Substrate Temperature on Structural Properties and Deposition Rate of AlN Thin Film Deposited by Reactive Magnetron Sputtering

✍ Scribed by Hao Jin, Bin Feng, Shurong Dong, Changjian Zhou, Jian Zhou, Yi Yang, Tianling Ren, Jikui Luo, Demiao Wang

Book ID
113087340
Publisher
Springer US
Year
2012
Tongue
English
Weight
594 KB
Volume
41
Category
Article
ISSN
0361-5235

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## Abstract Hexagonal aluminium nitride (AlN) and zinc oxide (ZnO) thin films have been deposited by DC and RF reactive magnetron sputtering at room temperature. For a first set of samples, sputtered AlN films were deposited on silicon ZnO substrate. For a second set, ZnO films were deposited on Al