✦ LIBER ✦

Influence of sputtering power and the substrate–target distance on the properties of ZrO2 films prepared by RF reactive sputtering

✍ Scribed by Pengtao Gao; L.J Meng; M.P dos Santos; V Teixeira; M Andritschky

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Influence of target-substrate distance a

✍ Huijuan Yang; Jun He; Canxin Tian; Chuansheng Liu; Dejun Fu 📂 Article 📅 2010 🏛 Wuhan University 🌐 English ⚖ 481 KB

Influence of target-to-substrate distanc

✍ S.H. Jeong; J.H. Boo 📂 Article 📅 2004 🏛 Elsevier Science 🌐 English ⚖ 423 KB

Effect of substrate temperature on the p

✍ M.H. Suhail; G. Mohan Rao; S. Mohan 📂 Article 📅 1992 🏛 Elsevier Science 🌐 English ⚖ 464 KB

Effect of RF power and sputtering pressu

✍ Prabitha B. Nair; V.B. Justinvictor; Georgi P. Daniel; K. Joy; V. Ramakrishnan; 📂 Article 📅 2011 🏛 Elsevier Science 🌐 English ⚖ 712 KB

Influence of the target and working gas

✍ M. Vila; C. Prieto; J. Garcı́a-López; M.A. Respaldiza 📂 Article 📅 2003 🏛 Elsevier Science 🌐 English ⚖ 665 KB

The effect of target erosion and RF subs

✍ J.N. Avaritsiotis; D.K. Sivridis; E. Roditi 📂 Article 📅 1987 🏛 Elsevier Science ⚖ 393 KB